WebThis provides the film with higher adhesion strength, resulting in a dense thin film. Ion beam sputter. Argon ions are ejected by applying a voltage to the ion gun (i.e. the sputtering source) from plasma generated by applying a high frequency to argon gas. The ejected argon ions collide with the target material and sputter the film material. WebIt describes the steps involved in ion plating, namely, surface preparation, nucleation, interface formation, and film growth. The article discusses the factors influencing the properties of ion-plated films. The sources of potential applied on substrate surface, bombarding species, and depositing species are addressed.
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Thermal stability and diffusion characteristics of ultrathin ... - Nature
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